Fluorine barrier properties of bias sputtered tungston films

Authors:

S.B. Herner

H.-M. Zhang

Y. Tanaka,

W. Shi

S.X. Yang

R. Lum

K. A. Littau

A. Saleh

Journal Name:

Electrochem

Volume:

147

Issue:

5

Pages From:

1936

To:

1939

Date:

Saturday, January 1, 2000